Nano Positioning for Large Scanning Range for XY Mechanism

Year : 2025 | Volume : 12 | Issue : 01 | Page : 30-35
    By

    Prasanna P. Raut,

  • A. S. Rao,

  • Shrishail Sollapur,

  • Devakant D. Baviskar,

  1. Research Scholar, Department of Mechanical Engineering, Veermata Jijabai Technological Institute, Matunga East, Mumbai, Maharashtra, India
  2. Assistant Professor, Department of Mechanical Engineering, Veermata Jijabai Technological Institute, Matunga East, Mumbai, Maharashtra, India
  3. Assistant Professor, Department of IIAEM & ME, Faculty of Engineering and Technology, JAIN (Deemed -to- be University), Bengaluru, Karnataka, India
  4. Research Scholar, Department of Mechanical Engineering, Veermata Jijabai Technological Institute, Matunga East, Mumbai, Maharashtra, India

Abstract

In this study, an XY flexure stage that provides a variety of motion options while reducing incorrect motions is designed and assessed. In the flexure design, the double parallelogram flexure modules are positioned methodically and symmetrically. The performance of the flexure stage is assessed using finite element analysis, and experimental testing is performed to validate the findings. The built-in prototype of the flexure stage has dimensions of 350 mm x 350 mm, a motion range of 7 mm x 7 mm, cross-axis flaw of less than 15 microns, and yaw flaws of less than 5 microradians. For precise applications in domains like semiconductor production, microscopy, and nanotechnology, nano positioning systems are essential. In an XY mechanism, achieving a wide scanning range while preserving nanometer accuracy poses difficulties about mechanical limitations, control accuracy, and structural stability. The basic ideas, importance, and benefits of nano positioning in long-range XY scanning methods are examined in this article. Important design factors, actuation methods, and control schemes required to accomplish high-performance positioning are covered.

Keywords: Flexure stage, FEA, Double Parallelogram Flexure, cross axis flaw, AFM

[This article belongs to Journal of Microelectronics and Solid State Devices ]

How to cite this article:
Prasanna P. Raut, A. S. Rao, Shrishail Sollapur, Devakant D. Baviskar. Nano Positioning for Large Scanning Range for XY Mechanism. Journal of Microelectronics and Solid State Devices. 2025; 12(01):30-35.
How to cite this URL:
Prasanna P. Raut, A. S. Rao, Shrishail Sollapur, Devakant D. Baviskar. Nano Positioning for Large Scanning Range for XY Mechanism. Journal of Microelectronics and Solid State Devices. 2025; 12(01):30-35. Available from: https://journals.stmjournals.com/jomsd/article=2025/view=208624


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Regular Issue Subscription Original Research
Volume 12
Issue 01
Received 04/02/2025
Accepted 08/02/2025
Published 25/02/2025
Publication Time 21 Days
Total Visits: 39


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