The Impact of Distinct Dopant Elements (Cu and Al) on the Electrochemical Characteristics of MgO Thin Films Formed Using the Electrodeposition Technique

Year : 2024 | Volume :01 | Issue : 02 | Page : 12-17
By

    Balkrishna J. Lokhande

  1. Mahadev T. Mhetre

  1. Professor, Lab of Electrochemical Studies, School of Physical Sciences, Punyashlok Ahilyadevi Holkar Solapur University, Maharashtra, India
  2. Student, Santosh Bhimrao Patil Arts, Commerce, and Science College, Mandrup, South Solapur, Solapur, Maharashtra, India

Abstract

By using an aqueous electrodeposition technique, copper (Cu) and aluminum (Al) doped magnesium oxide (MgO) thin films were created. We examined how the dopant elements affected the electrochemical characteristics of MgO thin films deposited on stainless steel (SS) substrates in the current study. We annealed the MgO-based films at 450◦C. The MgO films doped with Cu and Al have been determined by X-ray diffraction (XRD) results. Cyclic voltammetric analyses (CV), galvanostatic charge-discharge (GCD) technique, are the electrochemical methods. The redox behavior of both Cu and Al-doped and pristine MgO during the CV is confirmed by peaks in the CV curves. There was a maximum of 24.16 Fg-1 in the measured specific capacitance (SC) of Al-doped MgO. In contrast to typical capacitors, GCD analysis reveals distinct behavior. The charging and discharging times were found nearly the same for different applied currents.

Keywords: Electrodeposition technique, elements, Cyclic voltammetric analyses, medical devices, EDLC

[This article belongs to International Journal of Electro-Mechanics and Material Behavior(ijemb)]

How to cite this article: Balkrishna J. Lokhande, Mahadev T. Mhetre , The Impact of Distinct Dopant Elements (Cu and Al) on the Electrochemical Characteristics of MgO Thin Films Formed Using the Electrodeposition Technique ijemb 2024; 01:12-17
How to cite this URL: Balkrishna J. Lokhande, Mahadev T. Mhetre , The Impact of Distinct Dopant Elements (Cu and Al) on the Electrochemical Characteristics of MgO Thin Films Formed Using the Electrodeposition Technique ijemb 2024 {cited 2024 Mar 28};01:12-17. Available from: https://journals.stmjournals.com/ijemb/article=2024/view=136232


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Regular Issue Subscription Review Article
Volume 01
Issue 02
Received January 25, 2024
Accepted February 5, 2024
Published March 28, 2024