A Comprehensive Review on Deposition Techniques for Functional Thin Films

Year : 2025 | Volume : 12 | Issue : 01 | Page : 1 7
    By

    Rakshita Chaudhary,

  • Vanshika,

  • Meenakshi Tyagi,

  1. Senior Technical Assistant, Central Drugs Standard Control Organisation, FDA Bhawan, ITO, Kotla Marg, New Delhi, Uttar Pradesh, India
  2. Research Scholar, Banasthali Vidhyapeeth, Vanasthali Rd, Aliyabad, Radha Kishnpura, Rajasthan, India
  3. Assistant Professor, Department of Biotechnology, Institute of Management and Research, Ghaziabad, Uttar Pradesh, India

Abstract

Thin films have become a critical element in the design and development of advanced functional materials because of their remarkable versatility, high efficiency, and ability to be easily integrated into a wide variety of devices. These films are used in a broad range of industries, from electronics to energy, owing to their ability to improve the performance of components by providing tailored electrical, optical, and mechanical properties. The deposition of thin films plays a pivotal role in their fabrication, as the method used directly affects the resulting film’s quality, structure, and functionality. A variety of deposition techniques are employed to fabricate these films, each with its unique principles, advantages, and limitations. This article attempts to provide a thorough examination of the many deposition procedures, covering both established and new approaches. It provides an in-depth exploration of methods such as physical vapor deposition (PVD), chemical vapor deposition (CVD), and sputtering, as well as novel approaches like atomic layer deposition (ALD) and laser ablation. The paper delves into the fundamental principles behind these techniques, examining how they contribute to the creation of thin films with specific properties. In addition, the review outlines the advantages and challenges associated with each method, such as deposition rate, uniformity, and material compatibility. The applications of functional thin films are also explored, highlighting their use in photovoltaic cells, sensors, semiconductor devices, and energy storage technologies. This review ultimately aims to provide a thorough understanding of the current state of thin film deposition techniques, while also offering insights into the future trends and potential advancements that could further enhance their efficiency and applicability across various fields.

Keywords: Thin Films, Deposition Techniques, Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), Atomic Layer Deposition (ALD), Functional Materials

[This article belongs to Journal of Thin Films, Coating Science Technology & Application ]

How to cite this article:
Rakshita Chaudhary, Vanshika, Meenakshi Tyagi. A Comprehensive Review on Deposition Techniques for Functional Thin Films. Journal of Thin Films, Coating Science Technology & Application. 2025; 12(01):1-7.
How to cite this URL:
Rakshita Chaudhary, Vanshika, Meenakshi Tyagi. A Comprehensive Review on Deposition Techniques for Functional Thin Films. Journal of Thin Films, Coating Science Technology & Application. 2025; 12(01):1-7. Available from: https://journals.stmjournals.com/jotcsta/article=2025/view=201773


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Regular Issue Subscription Review Article
Volume 12
Issue 01
Received 03/02/2025
Accepted 09/02/2025
Published 18/02/2025
Publication Time 15 Days
451

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